A Novel Reflection Regarding Education

A Novel Reflection Regarding Education

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At the same time, China is working hard to develop its own lithography system. The Suzhou Institute of Nano-tech and Nano-Bionics under the Chinese Academy of Sciences (Sinano), along with the National Center for Nanoscience and Technology, recently announced a breakthrough in a new type official site of 5nm laser lithography technology. Experts believe it could lay the foundation for research into a self-developed advanced lithography machine. The new technology has broken the traditional constraint in laser direct writing (LDW) with its ability to process at the nano level. In addition to ultra-high precision, the technology also demonstrates potential for mass production. According to research results published in Nano Letters, a monthly peer-reviewed scientific journal, the new LDW technology "exhibits an attractive capability of well-site control and mass production of 500,000 nanogap electrodes per hour," breaking the trade-off between resolution and throughput using nanofabrication techniques. During the recent China International Import Expo (CIIE) in Shanghai, ASML, the global leader in lithography machines, showcased its deep ultraviolet (DUV) lithography machines, sending out a strong signal for its capability and willingness to export the equipment to China. Previously, ASML's CFO Roger Dassen has stated that the company can export DUV lithography machines to China without a U.S. license. The technology can typically produce chips down to the 7nm node.

https://www.prnewswire.com/il/news-releases/china-moves-closer-to-self-reliance-in-7nm-chip-production-822983467.html

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